China Achieves Semiconductor Breakthrough With First Homegrown Lithography Machine
ASML faces market pressure as domestic innovation reshapes global supply chains January 7, 2025 — Shanghai Microelectronics Equipment (SMEE) has successfully delivered China’s first domestically developed 28nm lithography machine, marking a watershed moment in the nation’s semiconductor industry. Capable of producing 28nm chips through single exposure and achieving 11nm process nodes via multi-patterning techniques, the […]
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